Categories: Coating & Deposition Lithography Systems

Spin Coater

Precision Thin Film Coating Technology The L-Spin Series Spin Coaters are precision systems engineered to produce uniform and well-controlled thin films on flat substrates. A small volume of coating material is dispensed onto the substrate surface and spread uniformly by spinning at speeds up to 12,000 rpm.

Precision Thin Film Coating Technology

The L-Spin Series Spin Coaters are precision systems engineered to produce uniform and well-controlled thin films on flat substrates. A small volume of coating material is dispensed onto the substrate surface and spread uniformly by spinning at speeds up to 12,000 rpm. The spin cycle continues until the desired film thickness is achieved, with real-time speed monitoring and adjustment ensuring highly repeatable and consistent coating quality.

Available Models

LSpin-04

  • Ideal solution for thin-film preparation
  • Vacuum chucks available for various substrate geometries starting from 5 mm × 5 mm
  • Enables uniform coating of photoresists, polymers, sol-gel materials, and similar chemistries

LSpin-06

  • Enhanced model designed for larger substrates and specialized coating processes
  • Features advanced vacuum chuck options and optimized speed control
  • Provides high accuracy and excellent film uniformity

General Features & Specifications

Spin Speed

100–12,000 rpm

Substrate Range

Interchangeable vacuum chucks for substrates ranging from 5–150 mm

Programmable Recipes

Up to 20 recipes, each with 10 programmable steps

User Interface

All functions accessible via 5-inch touchscreen for easy operation

Key Advantages

  • Removable Coating Chamber: Washable high-chemical-resistance PE/PTFE construction
  • Real-time Monitoring: Continuous speed monitoring and adjustment for consistent results
  • Flexible Configuration: Suitable for both small samples and large wafers
  • User-Friendly Design: Easy operation with minimal training required
  • High Repeatability: Precise control ensures consistent film thickness across batches

Applications

The L-Spin Series is ideal for photoresist coating in semiconductor fabrication, polymer film deposition, sol-gel processing, nanoparticle dispersion, optical coating applications, and research & development in materials science.

L-Spin Series Spin Coaters

Precision coating technology for uniform thin film deposition. Contact us for technical specifications and customization options!